Single-Electron Box Fabrication on Scanning Probe Tip for High-Resolution Electric Charge Detection

Description:

This technology presents novel fabrication methods for a single-electron box (SEB) integrated onto a scanning probe tip, utilizing atomic force microscopy (AFM) to measure electric forces rather than current for improved detection sensitivity and simplified operation. Two advanced fabrication techniques are developed, involving platinum-coated tips, atomic layer deposition, focused electron and ion beam processes, and annealing, resulting in stable and highly sensitive probes capable of single-electron tunneling detection at low temperatures. The device provides significant improvements for quantum computing research and related fields requiring nanoscale charge measurements.

Key Advantages:

• High spatial resolution electric charge and potential detection.
• Improved sensitivity via electric force measurement instead of current.
• Simplified fabrication and operation compared to existing methods.
• Stable and reproducible probe fabrication techniques.
• Compatibility with low-temperature testing environments.
• Potential for enhanced quantum computing instrumentation.

Problems Solved:

• Limitations of current-based scanning single-electron electrometers.
• Complexity and instability in probe fabrication and operation.
• Challenges in achieving high spatial resolution in electric charge measurements.
• Difficulty in integrating SEB devices onto scanning probe tips.

Market Applications:

• Quantum computing device characterization and development.
• Nanoscale electric charge and potential mapping for material science.
• Advanced scanning probe microscopy tools for research labs.
• Manufacture of precision probes for atomic force microscopy.
• Commercial probe manufacturing and instrumentation companies.