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Pulsed Laser Annealing for Diamond Doping
Description: This innovative method uses pulsed laser annealing (PLA) to incorporate and activate dopants in diamond thin films by first depositing a dopant precursor layer on the diamond surface and then applying targeted laser pulses. The process improves doping precision while reducing thermal damage compared to conventional techniques. Experimental...
Published: 3/10/2026
|
Updated: 3/10/2026
|
Inventor(s):
Ariful Haque
,
Saif Taqy
Keywords(s):
Microelectronics
,
Nanotechnology
,
Semiconductor Materials
,
Semiconductors
Category(s):
Nanotechnology
,
Semiconductors
Pulsed Laser Annealing Doping Technique for Aluminum Nitride (AlN)
Description: This innovative technique involves depositing a dopant precursor film on AlN substrates followed by PLA, which facilitates efficient dopant incorporation and activation. The process leverages rapid, localized heating to overcome challenges associated with doping AlN’s ultrawide bandgap and high resistivity. Validation through X-ray...
Published: 3/10/2026
|
Updated: 3/10/2026
|
Inventor(s):
Ariful Haque
,
Saif Taqy
Keywords(s):
Microelectronics
,
Nanotechnology
,
Semiconductor Materials
,
Semiconductors
Category(s):
Semiconductors
,
Nanotechnology
Surface Doping of Polycrystalline CVD Diamond Via Submerged Laser Annealing for Semiconductor Applications
Description: This innovation presents a pioneering method to dope polycrystalline CVD diamond by first immersing the diamond samples in a dopant-containing solution followed by a pulsed laser annealing under ambient conditions. This two-step process promotes the diffusion and activation of dopant atoms like boron into the diamond lattice without compromising...
Published: 3/18/2026
|
Updated: 12/16/2025
|
Inventor(s):
Ariful Haque
,
Adedayo Alaga
,
Saif Taqy
Keywords(s):
Material Science
,
Nanotechnology
,
Semiconductor Technology
,
Semiconductors
Category(s):
Nanotechnology
,
Semiconductors
,
Material Science
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